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Pfeiffer Vacuum presents innovative vacuum solutions at the trade fairs Semicon Korea and Semicon China

07.11.2016

Pfeiffer Vacuum, a leading global supplier of vacuum technology, will be exhibiting at the Semicon Korea Trade Fair in Seoul from January 27 to 29 and Semicon China in Shanghai from March 15 to 17.

Pfeiffer Vacuum, a leading global supplier of vacuum technology, will be exhibiting at the Semicon Korea Trade Fair in Seoul from January 27 to 29 and Semicon China in Shanghai from March 15 to 17.


Dry pumps A4 series Turbopump HiPace 2800 IT
Magnetically levitated turbopumps in the ATH-M series

Visitors to the booth can discuss innovative vacuum solutions with experts from Pfeiffer Vacuum.
“We are pleased to present important new vacuum solutions at the trade
fairs Semicon Korea and Semicon China. In an increasingly changing competitive
environment, Pfeiffer Vacuum is ideally set up as a rock-solid company, acting in theglobal arena as a reliable, long-term allround provider of vacuum technology for customers all over the world“, says Eric Taberlet, President of the Business Unit Semiconductor & Coating.
A4 series of dry pumps The dry, multi-stage Roots pumps in the A4 series provide pumping speeds of 100 to 2,300 m3/h. These energy-efficient and reliable pumps are ideal for use in demanding processes in the semiconductor and coating industries. With corrosion resistant materials and a high gas throughput, this pump series is optimally suited for use in CVD processes, for example.


Turbopump HiPace 2800 IT
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With the HiPace 2800 IT Pfeiffer Vacuum presents a turbopump especially dedicated for ion implantation applications. The sophisticated rotor design of the turbopump results in an optimized pumping speed for light gases. This ensures very good process adaption for ion implantation processes, were hydrogen is the most accumulating gas. With 2,750 l/s pumping speed for hydrogen the new HiPace 2800 IT is the best turbopump in its class.The intelligent temperature management system prevents process condensation and deposition inside the pumping system. It allows setting the temperature individually to ideally support the process. The special coating of the rotor ensures robustness against all ion implantation process materials. Being based on a so-called hybrid bearing, a combination of ceramic ball bearings on the fore-vacuum side and permanently magnetic radial bearings on the high vacuum side, these HiPace turbopumps have a particularly robust bearing design. Together with the efficient coating, this forms the basis for the long life cycle and maximum up-time of the pumps.

www.pfeiffer-vacuum.com

ar©tur 2016